Product Code : ST-Sc2O3-5N-ST
Scandium oxide sputtering targets can be used for semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. We are a supplier of high quality scandium oxide sputtering targets at competitive prices. ATT offers high quality scandium oxide sputtering targets at competitive prices for research and industrial purposes. We can provide scandium oxide sputtering targets with different purity, size and density according to your requirements.
ATT specializes in high-purity scandium oxide sputtering targets with the highest density high-purity (99.99%) metal sputtering targets and the smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays and optical applications. Our standard sputtering targets for thin films are available in single or combined flat target sizes and configurations up to 820 mm, with drill positions and threads, bevels, grooves and backings, designed for use with older sputtering units as well as the latest process equipment, such as large area coatings for solar or fuel cell and flip-chip applications. Research sizes are also targeted for production as well as custom sizes and alloys. All targets were analyzed using best-in-class demonstration techniques, including X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS), and inductively coupled plasma (ICP). "Sputtering" allows deposition of an ultra-high purity thin film of sputtered metal or oxide material onto another solid substrate, controlled removal of the target material by ion bombardment and conversion into a directed gas/plasma phase. In addition to rectangular, circular or oval targets of any size, we can also provide targets outside this range. Materials are produced by ultra-high purification processes such as crystallization, solid state and sublimation. ATT specializes in the production of custom compositions for commercial and research applications as well as new proprietary technologies. ATT also casts any rare earth metal and most other advanced materials into bars, rods or plates, and other mechanical shapes, and in solution and organometrics through other processes such as nanoparticles. We also produce scandium oxide particles, tablets, powders and tablets. Oxides do not conduct electricity. However, certain oxides of perovskite structures are electrically conductive and have found applications in the cathodes of solid oxide fuel cells and oxygen generation systems.
ATT is a professional supplier of scandium oxide (Sc2O3) sputtering targets, and we also produce discs, pellets, ingots, pellets, sheets, powders, rods, wires, sputtering targets, and many other forms and custom shapes. Other shapes are available upon request.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
| Product | Product Code | Purity | Size | Contact Us |
Product Information
Scandium oxide sputtering targets can be used for semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD) displays, and optical applications. We are a supplier of high quality scandium oxide sputtering targets at competitive prices. ATT offers high quality scandium oxide sputtering targets at competitive prices for research and industrial purposes. We can provide scandium oxide sputtering targets with different purity, size and density according to your requirements.
ATT specializes in high-purity scandium oxide sputtering targets with the highest density high-purity (99.99%) metal sputtering targets and the smallest average grain size for semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) displays and optical applications. Our standard sputtering targets for thin films are available in single or combined flat target sizes and configurations up to 820 mm, with drill positions and threads, bevels, grooves and backings, designed for use with older sputtering units as well as the latest process equipment, such as large area coatings for solar or fuel cell and flip-chip applications. Research sizes are also targeted for production as well as custom sizes and alloys. All targets were analyzed using best-in-class demonstration techniques, including X-ray fluorescence (XRF), glow discharge mass spectrometry (GDMS), and inductively coupled plasma (ICP). "Sputtering" allows deposition of an ultra-high purity thin film of sputtered metal or oxide material onto another solid substrate, controlled removal of the target material by ion bombardment and conversion into a directed gas/plasma phase. In addition to rectangular, circular or oval targets of any size, we can also provide targets outside this range. Materials are produced by ultra-high purification processes such as crystallization, solid state and sublimation. ATT specializes in the production of custom compositions for commercial and research applications as well as new proprietary technologies. ATT also casts any rare earth metal and most other advanced materials into bars, rods or plates, and other mechanical shapes, and in solution and organometrics through other processes such as nanoparticles. We also produce scandium oxide particles, tablets, powders and tablets. Oxides do not conduct electricity. However, certain oxides of perovskite structures are electrically conductive and have found applications in the cathodes of solid oxide fuel cells and oxygen generation systems.
ATT is a professional supplier of scandium oxide (Sc2O3) sputtering targets, and we also produce discs, pellets, ingots, pellets, sheets, powders, rods, wires, sputtering targets, and many other forms and custom shapes. Other shapes are available upon request.
Synonyms
Oxygen(-2) anion; scandium(+3) cation, Scandium(III) oxide, Scandia
Scandium Oxide (Sc2O3) Sputtering Target
| Shape | Disc/Rectangular/Tube |
| Bonding | Unbonding/Bonding |
| Symbol | Sc2O3 |
| Purity | 99.9% - 99.99% |
Per your request or drawing
We can customized as require
Scandium Oxide (Sc2O3) Sputtering Target Specification
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Scandium Oxide (Sc2O3) Sputtering Target Properties (Theoretical)
| Compound Formula | O3Sc2 |
| Molecular Weight | 137.91 |
| Appearance | White |
| Melting Point | 2,485° C (4,505° F) |
| Boiling Point | N/A |
| Density | 3860 kg/m-3 |
| Solubility in H2O | N/A |
| Exact Mass | 137.897 g/mol |
| Monoisotopic Mass | 137.896564 Da |
Applications of Scandium Oxide (Sc2O3) Sputtering Target
Scandium Oxide Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Scandium Oxide (Sc2O3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Scandium Oxide (Sc2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Sc2O3 |
| MDL Number | MFCD00011223 |
| EC No. | 235-042-0 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 4583683 |
| IUPAC Name | Oxygen(2-); scandium(3+) |
| SMILES | [Sc+3].[Sc+3].[O-2].[O-2].[O-2] |
| InchI Identifier | InChI=1S/3O.2Sc/q3*-2;2*+3 |
| InchI Key | HJGMWXTVGKLUAQ-UHFFFAOYSA-N |
MORE INFO
High purity and density
Low particle
Uniform film thickness distribution
High efficiency in the use
