Product Code : ST-Ba-5N-Cu
Barium (Ba) sputtering targets are used in physical vapor deposition (PVD) processes to deposit thin films of barium onto substrates such as glass or silicon. Barium is a chemical element with atomic number 56 and symbol Ba. It is a soft, silvery-white metal that oxidizes quickly in air.
Barium sputtering targets are typically made of high-purity barium metal or barium oxide (BaO) powder. They come in various shapes and sizes depending on the specific application, and are often used in conjunction with other sputtering targets such as titanium or aluminum to create multilayer thin films.
During the sputtering process, an inert gas such as argon is ionized and accelerated towards the target material, causing atoms to be ejected from the surface and deposit onto the substrate, forming a thin film. The properties of the resulting barium thin film can be adjusted by varying the sputtering conditions such as gas pressure, power, and target-to-substrate distance.
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Product Information
Barium (Ba) sputtering targets are used in physical vapor deposition (PVD) processes to deposit thin films of barium onto substrates such as glass or silicon. Barium is a chemical element with atomic number 56 and symbol Ba. It is a soft, silvery-white metal that oxidizes quickly in air.
Barium sputtering targets are typically made of high-purity barium metal or barium oxide (BaO) powder. They come in various shapes and sizes depending on the specific application, and are often used in conjunction with other sputtering targets such as titanium or aluminum to create multilayer thin films.
During the sputtering process, an inert gas such as argon is ionized and accelerated towards the target material, causing atoms to be ejected from the surface and deposit onto the substrate, forming a thin film. The properties of the resulting barium thin film can be adjusted by varying the sputtering conditions such as gas pressure, power, and target-to-substrate distance.
Chemical Formula: Ba
CAS Number: 7440-39-3
Synonyms
N/A
Barium (Ba) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Molecular Weight | 137.327 |
| Appearance | Solid |
| Melting Point | 727 °C |
| Boiling Point | 1845 °C |
| Density | 3.51 g/cm3 (°C) |
| Solubility in H2O | N/A |
| Crystal Phase / Structure | body-centered cubic (bcc) |
| Electrical Resistivity | 332 nΩ·m (20 °C) |
| Electronegativity | 0.89 Paulings |
| Heat of Fusion | 7.12 kJ/mol |
| Heat of Vaporization | 142 kJ/mol |
| Poisson's Ratio | 0.28 |
| Specific Heat | 192 J/K·kg |
| Thermal Conductivity | 18.4 W/m·K |
| Thermal Expansion | 20.6 µm/m·K (25 °C) |
| Young's Modulus | 13 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Barium (Ba)Sputtering Target
Barium (Ba) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Barium (Ba)Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Barium (Ba) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Ba |
| MDL Number | MFCD00134031 |
| EC No. | 231-149-1 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 5355457 |
| SMILES | [Ba] |
| InchI Identifier | InChI=1S/Ba |
| InchI Key | DSAJWYNOEDNPEQ-UHFFFAOYSA-N |
