Barium Fluoride (BaF2) Sputtering Target

Product Information

Barium Fluoride (BaF2) sputtering targets are used in thin film deposition processes, specifically in applications that require high-quality optical coatings. BaF2 is a transparent crystalline compound with a wide bandgap, making it ideal for applications such as anti-reflection coatings, mirrors, beam splitters, and windows in the ultraviolet (UV) and infrared (IR) regions.

Sputtering is a process where energetic ions are bombarded onto the surface of a target material, causing atoms or molecules to be ejected from the target and deposited onto a substrate, forming a thin film. BaF2 sputtering targets are typically made from high-purity BaF2 material, ensuring consistency and reliability in the thin film deposition process.

BaF2 sputtering targets are available in various sizes and shapes, depending on the specific deposition system requirements. They are commonly used in physical vapor deposition (PVD) techniques, such as magnetron sputtering or ion beam sputtering, to achieve precise and controllable deposition of BaF2 thin films.

These sputtering targets need to be handled with care to avoid contamination and damage. Proper storage and handling techniques, along with appropriate sputtering parameters, are necessary to achieve high-quality thin films with excellent optical properties.

Overall, BaF2 sputtering targets play a crucial role in the production of optical coatings with desirable optical properties, making them vital components in various industries, including optics, electronics, and aerospace.

Chemical Formula: BaF2

CAS Number: 7787-32-8

Synonyms

Barium Fluoride (BaF2) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Porperties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Barium Fluoride (BaF2) Sputtering Target

Barium Fluoride (BaF2) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Barium Fluoride (BaF2)  Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Barium Fluoride (BaF2) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifier