Product Code : ST-CaF2-5N-Cu
Calcium Fluoride (CaF2) sputtering targets are widely used in thin film deposition processes for various applications, especially in the field of optics and photonics. CaF2 is a transparent compound with excellent optical properties, making it suitable for applications such as anti-reflection coatings, mirrors, lenses, and windows.
Sputtering is a deposition technique where energetic ions bombard the surface of a target material, causing atoms or molecules to be dislodged and deposited onto a substrate, forming a thin film. CaF2 sputtering targets are usually made from high-purity CaF2 material to ensure consistent and reliable film deposition.
CaF2 sputtering targets are available in different shapes and sizes, depending on the specific requirements of the deposition system. They can be used in various physical vapor deposition (PVD) techniques, including magnetron sputtering, ion beam sputtering, or electron beam evaporation, to achieve precise and controlled deposition of CaF2 thin films.
Proper handling and storage of CaF2 sputtering targets are crucial to maintain their purity and prevent contamination. Additionally, optimizing the sputtering parameters and deposition conditions are essential for obtaining high-quality thin films with desirable optical properties.
Overall, CaF2 sputtering targets play a vital role in the production of high-performance optical coatings and components, making them essential in industries such as optics, telecommunications, aerospace, and more.
Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.
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Product Information
Calcium Fluoride (CaF2) sputtering targets are widely used in thin film deposition processes for various applications, especially in the field of optics and photonics. CaF2 is a transparent compound with excellent optical properties, making it suitable for applications such as anti-reflection coatings, mirrors, lenses, and windows.
Sputtering is a deposition technique where energetic ions bombard the surface of a target material, causing atoms or molecules to be dislodged and deposited onto a substrate, forming a thin film. CaF2 sputtering targets are usually made from high-purity CaF2 material to ensure consistent and reliable film deposition.
CaF2 sputtering targets are available in different shapes and sizes, depending on the specific requirements of the deposition system. They can be used in various physical vapor deposition (PVD) techniques, including magnetron sputtering, ion beam sputtering, or electron beam evaporation, to achieve precise and controlled deposition of CaF2 thin films.
Proper handling and storage of CaF2 sputtering targets are crucial to maintain their purity and prevent contamination. Additionally, optimizing the sputtering parameters and deposition conditions are essential for obtaining high-quality thin films with desirable optical properties.
Overall, CaF2 sputtering targets play a vital role in the production of high-performance optical coatings and components, making them essential in industries such as optics, telecommunications, aerospace, and more.
Chemical Formula: CaF2
Calcium Fluoride (CaF2) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Porperties（Theoretical）
| Compound Formula | CaF2 |
| Molecular Weight | 78.07 |
| Appearance | Solid |
| Melting Point | 1420 °C (2590 °F) |
| Boiling Point | N/A |
| Density | 3.2 g/cm3 |
| Solubility in H2O | 0.0017 (293K) |
| Refractive Index | 1.4 |
| Crystal Phase / Structure | Cubic |
| Poisson's Ratio | 0.26 |
| Specific Heat | 854 J·kg/m·K |
| Thermal Conductivity | 9.7 W/m·K |
| Thermal Expansion | 19 µm/m-K |
| Young's Modulus | 80 GPa |
| Exact Mass | 77.9594 |
| Monoisotopic Mass | 77.9594 |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Calcium Fluoride (CaF2) Sputtering Target
Calcium Fluoride (CaF2) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Calcium Fluoride (CaF2) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Calcium Fluoride (CaF2) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifier
| Linear Formula | CaF2 |
| MDL Number | MFCD00010907 |
| EC No. | 232-188-7 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 24617 |
| IUPAC Name | calcium difluoride |
| SMILES | [Ca+2].[F-].[F-] |
| InchI Identifier | InChI=1S/Ca.2FH/h;2*1H/q+2;;/p-2 |
| InchI Key | WUKWITHWXAAZEY-UHFFFAOYSA-L |
