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Dysprosium Fluoride (DyF3) Sputtering Target

Product Code : ST-DyF3-5N-Cu

Dysprosium Fluoride (DyF3) Sputtering Target is a specialized thin film deposition material used in physical vapor deposition (PVD) processes. It is commonly employed in industries such as semiconductor, magnetic storage, and optical coating.

DyF3 sputtering targets are made of high-purity Dysprosium Fluoride (DyF3) material and are designed to be compatible with various sputtering systems, such as magnetron sputtering and RF sputtering. These targets are typically circular or rectangular in shape and are available in different sizes and dimensions.

Dysprosium fluoride, with the chemical formula DyF3, is a compound consisting of dysprosium and fluorine. It is known for its high melting point and excellent thermal stability, making it suitable for high-temperature sputtering processes. DyF3 targets are used to deposit thin films of dysprosium fluoride onto substrates, providing them with specific properties, such as magnetic, optical, or electrical characteristics.

Some key properties and advantages of DyF3 sputtering targets include high purity, good film adhesion, excellent uniformity, and controlled stoichiometry. These targets are engineered to have controlled composition and microstructure, ensuring consistent film properties across the deposited layers.

In summary, DyF3 sputtering targets are crucial for the production of advanced thin films and coatings, enabling the development of various electronic, magnetic, and optical devices.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Dysprosium Fluoride (DyF3) Sputtering Target ST-DyF3-2N-Cu 99% Customize
Dysprosium Fluoride (DyF3) Sputtering Target ST-DyF3-3N-Cu 99.9% Customize
Dysprosium Fluoride (DyF3) Sputtering Target ST-DyF3-4N-Cu 99.99% Customize
Dysprosium Fluoride (DyF3) Sputtering Target ST-DyF3-5N-Cu 99.999% Customize

Product Information

Dysprosium Fluoride (DyF3) Sputtering Target is a specialized thin film deposition material used in physical vapor deposition (PVD) processes. It is commonly employed in industries such as semiconductor, magnetic storage, and optical coating.

DyF3 sputtering targets are made of high-purity Dysprosium Fluoride (DyF3) material and are designed to be compatible with various sputtering systems, such as magnetron sputtering and RF sputtering. These targets are typically circular or rectangular in shape and are available in different sizes and dimensions.

Dysprosium fluoride, with the chemical formula DyF3, is a compound consisting of dysprosium and fluorine. It is known for its high melting point and excellent thermal stability, making it suitable for high-temperature sputtering processes. DyF3 targets are used to deposit thin films of dysprosium fluoride onto substrates, providing them with specific properties, such as magnetic, optical, or electrical characteristics.

Some key properties and advantages of DyF3 sputtering targets include high purity, good film adhesion, excellent uniformity, and controlled stoichiometry. These targets are engineered to have controlled composition and microstructure, ensuring consistent film properties across the deposited layers.

In summary, DyF3 sputtering targets are crucial for the production of advanced thin films and coatings, enabling the development of various electronic, magnetic, and optical devices.

Chemical Formula: DyF3

CAS Number:  13569-80-7


Dysprosium Fluoride (DyF3) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”



Porperties(Theoretical)

Compound FormulaDyF3
Molecular Weight219.5
AppearanceWhite
Melting Point1360 °C (2480 °F)
Boiling Point2200 °C (3992 °F)
Density5.948 g/cm3
Solubility in H2ON/A
Exact Mass220.924 g/mol
Monoisotopic Mass220.92441 Da




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Dysprosium Fluoride (DyF3) Sputtering Target

Dysprosium Fluoride (DyF3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Dysprosium Fluoride (DyF3) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Dysprosium Fluoride (DyF3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifier

Linear FormulaDyF3
MDL NumberMFCD00016071
EC No.236-992-9
Beilstein/Reaxys No.N/A
Pubchem CID83587
IUPAC NameTrifluorodysprosium
SMILESF[Dy](F)F
InchI IdentifierInChI=1S/Dy.3FH/h;3*1H/q+3;;;/p-3
InchI KeyFWQVINSGEXZQHB-UHFFFAOYSA-K




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