Product Code : ST-InFe2O4-5N-Cu
Indium Iron Oxide (InFe2O4) sputtering target is a solid material that is used as a source of InFe2O4 in sputtering processes. It is commonly used to create thin films with controlled electrical properties, such as magnetic materials and catalytically active electrodes. InFe2O4 thin films have potential applications in various fields, including spintronics, magnetic sensors, and energy research.
The manufacturing process of InFe2O4 sputtering targets involves the preparation of a target powder mixture of indium (III) oxide (In2O3) and iron(III) oxide (Fe2O3). The powder mixture is then compacted and sintered to form a homogeneous sputtering target with high density, purity, and uniformity.
During sputtering, the target is bombarded with high-energy ions, causing atoms or ions of InFe2O4 to be ejected from its surface and deposited onto the substrate. The resulting thin film is highly uniform, and its thickness and properties can be accurately controlled.
InFe2O4 sputtering targets are widely used in the research and manufacture of magnetic materials, magnetic sensors, and catalytically active electrodes. These materials are useful in various applications, such as information storage, imaging, and sensing.
In summary, InFe2O4 sputtering targets are essential components in the deposition of thin films for various applications. With the continuous development of new technologies, their potential uses are only growing.
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Product Information
Indium Iron Oxide (InFe2O4) sputtering target is a solid material that is used as a source of InFe2O4 in sputtering processes. It is commonly used to create thin films with controlled electrical properties, such as magnetic materials and catalytically active electrodes. InFe2O4 thin films have potential applications in various fields, including spintronics, magnetic sensors, and energy research.
The manufacturing process of InFe2O4 sputtering targets involves the preparation of a target powder mixture of indium (III) oxide (In2O3) and iron(III) oxide (Fe2O3). The powder mixture is then compacted and sintered to form a homogeneous sputtering target with high density, purity, and uniformity.
During sputtering, the target is bombarded with high-energy ions, causing atoms or ions of InFe2O4 to be ejected from its surface and deposited onto the substrate. The resulting thin film is highly uniform, and its thickness and properties can be accurately controlled.
InFe2O4 sputtering targets are widely used in the research and manufacture of magnetic materials, magnetic sensors, and catalytically active electrodes. These materials are useful in various applications, such as information storage, imaging, and sensing.
In summary, InFe2O4 sputtering targets are essential components in the deposition of thin films for various applications. With the continuous development of new technologies, their potential uses are only growing.
Chemical Formula: InFe2O4
Synonyms
Indium ferrite, indium-doped iron oxide
Indium Iron Oxide (InFe2O4) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Compound Formula | InFe2O4 |
| Molecular Weight | 290.51 |
| Appearance | Reddish target |
| Melting Point | N/A |
| Boiling Point | N/A |
| Density | N/A |
| Solubility in H2O | N/A |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Indium Iron Oxide (InFe2O4) Sputtering Target
Indium Iron Oxide (InFe2O4) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Indium Iron Oxide (InFe2O4) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Indium Iron Oxide (InFe2O4) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
