Product Code : ST-LaNbO3-5N-Cu
Lanthanum Niobium Oxide (LaNbO3) sputtering target is a material used in thin film deposition processes, particularly in the production of high-performance electronic devices, such as capacitors, piezoelectric devices, and resistors. The sputtering process involves bombarding the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate.
LaNbO3 sputtering targets are widely used due to their excellent electrical properties that include high dielectric constant, low loss tangent, and high-temperature stability. These properties make them an ideal material for the production of capacitors, piezoelectric devices, and high-frequency filters.
The production of LaNbO3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.
Overall, LaNbO3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced electronic applications that require thin film deposition. They have been extensively studied for their use in producing advanced electronic devices with improved performance and efficiency.
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Product Information
Lanthanum Niobium Oxide (LaNbO3) sputtering target is a material used in thin film deposition processes, particularly in the production of high-performance electronic devices, such as capacitors, piezoelectric devices, and resistors. The sputtering process involves bombarding the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate.
LaNbO3 sputtering targets are widely used due to their excellent electrical properties that include high dielectric constant, low loss tangent, and high-temperature stability. These properties make them an ideal material for the production of capacitors, piezoelectric devices, and high-frequency filters.
The production of LaNbO3 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.
Overall, LaNbO3 sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced electronic applications that require thin film deposition. They have been extensively studied for their use in producing advanced electronic devices with improved performance and efficiency.
Chemical Formula:LaNbO3
Lanthanum Niobium Oxide (LaNbO3) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Lanthanum Niobium Oxide (LaNbO3) Sputtering Target
Lanthanum Niobium Oxide (LaNbO3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Lanthanum Niobium Oxide (LaNbO3) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Lanthanum Niobium Oxide (LaNbO3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
