Product Code : ST-Ti/Al/V-5N-Cu
A Titanium Aluminum Vanadium (Ti/Al/V) sputtering target is a material used in thin film deposition by sputtering, a process where the target material is bombarded with high-energy ions to eject atoms and form a thin film on a substrate. Ti/Al/V sputtering targets are made of a mixture of titanium, aluminum, and vanadium, three metals that exhibit unique mechanical, thermal, and chemical properties.
Titanium is a strong, lightweight metal that is resistant to corrosion and high temperatures. Aluminum is a soft, ductile metal that is easy to work with and has good thermal and electrical conductivity. Vanadium is a hard, silvery-grey metal that is highly resistant to corrosion and has excellent strength and toughness.
Ti/Al/V sputtering targets are commonly used in the aerospace industry to create coatings and films that enhance the performance of high-stress components such as turbine blades, exhaust systems, and structural parts. They are also used in the medical and dental industries to produce implantable devices and in the automotive industry for wear-resistant coatings. The targets are available in various shapes and sizes, including discs, rectangles, tubes, and custom configurations, depending on the specific requirements of the deposition process.
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Product Information
A Titanium Aluminum Vanadium (Ti/Al/V) sputtering target is a material used in thin film deposition by sputtering, a process where the target material is bombarded with high-energy ions to eject atoms and form a thin film on a substrate. Ti/Al/V sputtering targets are made of a mixture of titanium, aluminum, and vanadium, three metals that exhibit unique mechanical, thermal, and chemical properties.
Titanium is a strong, lightweight metal that is resistant to corrosion and high temperatures. Aluminum is a soft, ductile metal that is easy to work with and has good thermal and electrical conductivity. Vanadium is a hard, silvery-grey metal that is highly resistant to corrosion and has excellent strength and toughness.
Ti/Al/V sputtering targets are commonly used in the aerospace industry to create coatings and films that enhance the performance of high-stress components such as turbine blades, exhaust systems, and structural parts. They are also used in the medical and dental industries to produce implantable devices and in the automotive industry for wear-resistant coatings. The targets are available in various shapes and sizes, including discs, rectangles, tubes, and custom configurations, depending on the specific requirements of the deposition process.
Chemical Formula:Ti/Al/V
CAS Number: 12743-70-3
Synonyms
Titanium 6AL-4V, Titanium Ti 6AL 4V, Grade 5, Ti-6Al-4V, Ti 6-4, Ti6Al4V, TiAlV alloy, 99906-66-8, 12743-70-3
Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Appearance | Target |
| Melting Point | 1604-1660 °C |
| Boiling Point | N/A |
| Density | 4.43 g/cm3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 0.000178 ohm-cm |
| Specific Heat | 0.5263 J/g-°C |
| Tensile Strength | 950-1000 MPa |
| Thermal Conductivity | 6.7 W/m-K |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target
Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’ Titanium Aluminum Vanadium (Ti/Al/V) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
