Product Code : ST-Zn3N2-5N-Cu
Zinc Nitride (Zn3N2) is a sputtering target material that is used in thin-film deposition processes. The sputtering process involves the bombardment of the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate. Zinc nitride is a promising material for the production of semiconductor devices and optoelectronics.
Zn3N2 sputtering targets offer excellent electrical and optical properties, which make them ideal for use in the production of nitride-based optoelectronic devices such as LEDs, solar cells, and laser diodes. Zinc nitride is a direct bandgap semiconductor, which means it can emit light efficiently, making it a promising material for the production of optoelectronic devices.
The production of Zn3N2 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.
Overall, Zinc Nitride (Zn3N2) sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced applications that require high-quality thin film deposition of nitride-based semiconductors and optoelectronic devices.
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Product Information
Zinc Nitride (Zn3N2) is a sputtering target material that is used in thin-film deposition processes. The sputtering process involves the bombardment of the target material with high-energy particles in a low-pressure atmosphere, which results in the deposition of a thin film onto a substrate. Zinc nitride is a promising material for the production of semiconductor devices and optoelectronics.
Zn3N2 sputtering targets offer excellent electrical and optical properties, which make them ideal for use in the production of nitride-based optoelectronic devices such as LEDs, solar cells, and laser diodes. Zinc nitride is a direct bandgap semiconductor, which means it can emit light efficiently, making it a promising material for the production of optoelectronic devices.
The production of Zn3N2 sputtering targets requires high-purity raw materials and a specialized manufacturing process to ensure precise control over the target's properties, such as its composition, density, and microstructure. The resulting sputtering target must be uniform and defect-free to ensure consistent and high-quality thin film deposition.
Overall, Zinc Nitride (Zn3N2) sputtering targets offer excellent performance characteristics and are an ideal choice for many advanced applications that require high-quality thin film deposition of nitride-based semiconductors and optoelectronic devices.
Chemical Formula: Zn3N2
Synonyms
Zinc dinitride, Trizinc dinitride
Zinc Nitride (Zn3N2) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Porperties（Theoretical）
| Compound Formula | N2Zn3 |
| Molecular Weight | 224.2 |
| Appearance | Gray Target |
| Melting Point | 700 °C (decomposes) |
| Boiling Point | N/A |
| Density | 6.2 g/cm3 |
| Solubility in H2O | Insoluble; reacts |
| Crystal Phase / Structure | Cubic |
| Exact Mass | 221.790466 g/mol |
| Monoisotopic Mass | 219.793575 g/mol |
| Charge | N/A |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Zinc Nitride (Zn3N2) Sputtering Target
Zinc Nitride (Zn3N2) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Zinc Nitride (Zn3N2)Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Zinc Nitride (Zn3N2) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifier
| Linear Formula | Zn3N2 |
| MDL Number | MFCD00061327 |
| EC No. | 215-207-3 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 12130759 |
| IUPAC Name | zinc; azanidylidenezinc |
| SMILES | [N-]=[Zn].[N-]=[Zn].[Zn+2] |
| InchI Identifier | InChI=1S/2N.3Zn/q2*-1;;;+2 |
| InchI Key | AKJVMGQSGCSQBU-UHFFFAOYSA-N |
