Cesium Fluoride (CsF) Sputtering Target

Product Information

Cesium Fluoride (CsF) Sputtering Target is a high-quality thin film deposition material used in physical vapor deposition (PVD) processes. It is commonly utilized in semiconductor, solar cell, and display manufacturing industries.

CsF sputtering targets are made of highly pure CsF material and are designed to be compatible with various sputtering systems, such as magnetron sputtering and RF sputtering. These targets are typically circular or rectangular in shape and are available in different sizes and dimensions.

Cesium fluoride is a crystalline compound with a chemical formula CsF. It has a high melting point and good thermal stability, making it suitable for sputtering applications. CsF targets are used to deposit thin films of cesium fluoride onto substrates, which can enhance the performance and efficiency of various electronic and optoelectronic devices.

Some key properties and benefits of CsF sputtering targets include high purity, high density, excellent uniformity, and good adhesion to substrates. These targets are engineered to provide precise control over the deposition process, ensuring the desired film thickness, composition, and quality.

Overall, CsF sputtering targets are important materials for the production of advanced electronic devices and are valued for their reliable performance and consistent film properties.

Chemical Formula: CsF

CAS Number:  7758-88-5

Cesium Fluoride (CsF) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Porperties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Cesium Fluoride (CsF) Sputtering Target

Cesium Fluoride (CsF) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Cesium Fluoride (CsF) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Cesium Fluoride (CsF) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifier