Holmium Oxide (Ho2O3) Sputtering Target

Product Information

Holmium oxide (Ho2O3) sputtering target is a solid piece of material that is used as a source of holmium oxide in sputtering processes. It is commonly used in thin film deposition to create highly uniform and high-quality holmium oxide films on various substrates.

Holmium oxide sputtering targets are made of high-purity, dense, and homogeneous materials. The manufacturing process usually involves powder metallurgy techniques, which involve pressing and sintering holmium oxide powder to form a compact target.

The sputtering process involves bombarding the holmium oxide target with high-energy ions, causing the atoms to be ejected from the surface and deposited onto the substrate. The resulting thin film deposition is highly controllable, allowing for precise thickness and composition control.

Holmium oxide sputtering targets are used in various applications, such as magneto-optic recording media, magnetic thin film storage devices, high reflectivity mirrors, and protective coatings in electronic and optical devices. The holmium oxide thin films exhibit high transparency, optical and magnetic properties, making them ideal for use in magneto-optic recording and storage applications.

Overall, Holmium oxide sputtering targets are key components in high-quality thin film deposition processes and their use is expected to continue to grow in many different industries.

Chemical Formula: Ho2O3

CAS Number:   12055-62-8

SynonymsHolmia, Holmium(III) oxide, Holmium(+3) cation; oxygen(-2) anion, Rare earth

Holmium Oxide (Ho2O3) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size：

Properties（Theoretical）

Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.

Application of Holmium Oxide (Ho2O3)Sputtering Target

Holmium Oxide (Ho2O3) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.

Packing of  Holmium Oxide (Ho2O3) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Holmium Oxide (Ho2O3) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.

Chemical Identifiers