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Zirconium Nitride (ZrN) Sputtering Target

Product Code : ST-ZrN-5N-Cu

Zirconium Nitride (ZrN) sputtering target is a high performance material used in thin film coating applications. It is made of pure zirconium and nitrogen compound and is used as a cathode material in a process called sputtering.

In sputtering, a target material is bombarded with positive ions, causing the release of atoms from the target surface. These atoms then deposit on a substrate placed in front of the target, forming a thin film. This process is commonly used in the production of semiconductors, optics, and magnetic storage devices.

ZrN sputtering target has excellent hardness, adhesion, wear resistance, and chemical resistance properties, making it ideal for wear-resistant coatings, cutting tools, decorative coatings, and optical coatings. It is also used in aerospace and defense industries for the production of heat-resistant coatings and fuel cells.

The ZrN sputtering target is available in various sizes and shapes, including disks, plates, and tubes, to meet the specific requirements of different applications. Its high purity and uniformity ensure consistent and reliable deposition of the desired coatings.


Please contact us if you need customized services. We will contact you with the price and availability in 24 hours.

Product Product Code Purity Size Contact Us
Zirconium Nitride (ZrN) Sputtering Target ST-ZrN-2N-Cu 99% Customize
Zirconium Nitride (ZrN) Sputtering Target ST-ZrN-3N-Cu 99.9% Customize
Zirconium Nitride (ZrN) Sputtering Target ST-ZrN-4N-Cu 99.99% Customize
Zirconium Nitride (ZrN) Sputtering Target ST-ZrN-5N-Cu 99.999% Customize

Product Information

Zirconium Nitride (ZrN) sputtering target is a high performance material used in thin film coating applications. It is made of pure zirconium and nitrogen compound and is used as a cathode material in a process called sputtering.

In sputtering, a target material is bombarded with positive ions, causing the release of atoms from the target surface. These atoms then deposit on a substrate placed in front of the target, forming a thin film. This process is commonly used in the production of semiconductors, optics, and magnetic storage devices.

ZrN sputtering target has excellent hardness, adhesion, wear resistance, and chemical resistance properties, making it ideal for wear-resistant coatings, cutting tools, decorative coatings, and optical coatings. It is also used in aerospace and defense industries for the production of heat-resistant coatings and fuel cells.

The ZrN sputtering target is available in various sizes and shapes, including disks, plates, and tubes, to meet the specific requirements of different applications. Its high purity and uniformity ensure consistent and reliable deposition of the desired coatings.

Chemical Formula: ZrN

CAS Number:  1313-49-1

Synonyms

Zinc dinitride, Trizinc dinitride


Indium Zinc Oxide (In2O3/ZnO) Sputtering Target Specification

Shape: Disc/Rectangular/Tube

Bonding: Unbonding/Bonding

Per your request or drawing

We can customized as required

Size:

Circular   Sputtering TargetsDiameter1.0”2.0”3.0”4.0”5.0”6.0”up to 21”
Rectangular   Sputtering TargetsWidth x Length5” x 12”5” x 15”5” x 20”5” x 22”6” x 20”
Thickness0.125”, 0.25”


Properties(Theoretical)

Compound FormulaN2Zn3
Molecular Weight224.2
AppearanceGray Target
Melting Point700 °C (decomposes)
Boiling PointN/A
Density6.2 g/cm3
Solubility in H2OInsoluble; reacts
Crystal Phase / StructureCubic
Exact Mass221.790466 g/mol
Monoisotopic Mass219.793575 g/mol
ChargeN/A




Sputtering Targets Requirements

General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.


Application of Zirconium Nitride (ZrN)Sputtering Target

Zirconium Nitride (ZrN) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.


Packing of  Zirconium Nitride (ZrN) Sputtering Target

Standard Packing:

Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.

ATTs’Zirconium Nitride (ZrN) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.


Chemical Identifiers

Linear FormulaZn3N2
MDL NumberMFCD00061327
EC No.215-207-3
Beilstein/Reaxys No.N/A
Pubchem CID12130759
IUPAC Namezinc; azanidylidenezinc
SMILES[N-]=[Zn].[N-]=[Zn].[Zn+2]
InchI IdentifierInChI=1S/2N.3Zn/q2*-1;;;+2
InchI KeyAKJVMGQSGCSQBU-UHFFFAOYSA-N




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