Product Code : ST-Nd-5N-Cu
Neodymium sputtering target is a high-purity source material used in physical vapor deposition (PVD) processes to deposit neodymium thin films on various substrates. Nd sputtering target is made of neodymium metal, which has the highest magnetic moment of all elements and is widely used in various magnetic applications such as motors, generators, magnetic sensors, and hard disk drives.
The neodymium sputtering target is typically produced by powder metallurgy techniques such as hot pressing and cold isostatic pressing. The high purity of the neodymium metal ensures a high-quality thin film with minimum impurities, resulting in excellent film properties such as adhesion, structure, and electrical conductivity.
Neodymium sputtering targets are available in various shapes and sizes, including round, rectangular, and custom shapes, to fit different sputtering systems. The target is mounted onto the sputtering chamber and bombarded with ions to eject neodymium atoms, which then condense on the substrate to form a homogenous and uniform thin film.
Neodymium sputtering targets offer several advantages over other deposition techniques, including high purity, good adhesion, and superior film quality. They are widely used in various applications in the electronics, optics, and magnetic storage industries.
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Product Information
Neodymium sputtering target is a high-purity source material used in physical vapor deposition (PVD) processes to deposit neodymium thin films on various substrates. Nd sputtering target is made of neodymium metal, which has the highest magnetic moment of all elements and is widely used in various magnetic applications such as motors, generators, magnetic sensors, and hard disk drives.
The neodymium sputtering target is typically produced by powder metallurgy techniques such as hot pressing and cold isostatic pressing. The high purity of the neodymium metal ensures a high-quality thin film with minimum impurities, resulting in excellent film properties such as adhesion, structure, and electrical conductivity.
Neodymium sputtering targets are available in various shapes and sizes, including round, rectangular, and custom shapes, to fit different sputtering systems. The target is mounted onto the sputtering chamber and bombarded with ions to eject neodymium atoms, which then condense on the substrate to form a homogenous and uniform thin film.
Neodymium sputtering targets offer several advantages over other deposition techniques, including high purity, good adhesion, and superior film quality. They are widely used in various applications in the electronics, optics, and magnetic storage industries.
Chemical Formula: Nd
CAS Number: 7440-00-8
Synonyms
N/A
Neodymium (Nd) Sputtering Target Specification
Shape: Disc/Rectangular/Tube
Bonding: Unbonding/Bonding
Per your request or drawing
We can customized as required
Size：
| Circular Sputtering Targets | Diameter | 1.0”2.0”3.0”4.0”5.0”6.0”up to 21” |
| Rectangular Sputtering Targets | Width x Length | 5” x 12”5” x 15”5” x 20”5” x 22”6” x 20” |
| Thickness | 0.125”, 0.25” | |
Properties（Theoretical）
| Molecular Weight | 144.24 |
| Appearance | Silvery |
| Melting Point | 1024°C |
| Boiling Point | 3100 °C |
| Density | 6800 kg/m3 |
| Solubility in H2O | N/A |
| Electrical Resistivity | 64.0 microhm-cm @ 25°C |
| Electronegativity | 1.2 Paulings |
| Heat of Vaporization | 69 K-Cal/gm atom at 3068°C |
| Poisson's Ratio | ( form) 0.281 |
| Specific Heat | 0.049 Cal/g/K @ 25°C |
| Tensile Strength | N/A |
| Thermal Conductivity | 0.165 W/cm/K @ 298.2 K |
| Thermal Expansion | 6.89 g·cm3 |
| Vickers Hardness | 343 MPa |
| Young's Modulus | (form) 41.4 GPa |
Sputtering Targets Requirements
General requirements such as size, flatness, purity, impurity content, density, N/O/C/S, grain size, and defect control. Special requirements include surface roughness, resistance value, grain size uniformity, composition and tissue uniformity, magnetic conductivity, ultra-high density, ultra-fine grains, etc.
Application of Neodymium (Nd) Sputtering Target
Neodymium (Nd) Sputtering Target is mainly used in the electronics and information industry, glass coating field, wear-resistant materials, high-temperature corrosion resistance, high-grade decorative goods, and other industries.
Packing of Neodymium (Nd) Sputtering Target
Standard Packing:
Typical bulk packaging includes palletized plastic 5 gallon/25 kg. pails, fiber and steel drums to 1 ton super sacks in full container (FCL) or truck load (T/L) quantities. Research and sample quantities and hygroscopic, oxidizing or other air sensitive materials may be packaged under argon or vacuum. Solutions are packaged in polypropylene, plastic or glass jars up to palletized 440 gallon liquid totes Special package is available on request.
ATTs’Neodymium (Nd) Sputtering Target is carefully handled to minimize damage during storage and transportation and to preserve the quality of our products in their original condition.
Chemical Identifiers
| Linear Formula | Nd |
| MDL Number | MFCD00011130 |
| EC No. | 231-109-3 |
| Beilstein/Reaxys No. | N/A |
| Pubchem CID | 23934 |
| SMILES | [Nd] |
| InchI Identifier | InChI=1S/Nd |
| InchI Key | QEFYFXOXNSNQGX-UHFFFAOYSA-N |
